Technology
SIJTechnology, Inc. is engaged in the research and development of super-fine inkjet technology based on the research results developed by the National Institute of Advanced Industrial Science and Technology (AIST).
Features of super-fine inkjet technology
The super-fine inkjet technology developed by the Nanotechnology Research Institute of AIST allows the ejection of super-fine droplets much smaller than the conventional droplets ejected by a conventional inkjet printer-at least 1/10 smaller in size and 1/1000 smaller in volume.
Awards
- March 8, 2002
- Nano-Tech Award (on Nano Fabrication Technology) at the 1st International Nanotechnology Exhibition and Conference, nano tech 2002.
- April 1, 2004
- AIST President Award 2004 (Real Research Award).
- June 20, 2004
- Nippon Keidanren Chairman's Award of the Conference for the Promotion of Collaboration among Industry, Academia and Government.
- April 19, 2006
- A paper, “Fine Pitch Micro-bumps and Micro-wires Printed by Super Inkjet Technology,” published in ICEP2005 won the best-paper award.
Super-fine inkjet system
Out super-fine inkjet system is compact and can be placed on a desktop. The system allows single micron scale patterns comparable to the photolithographic methods to be drawn directly under normal temperature and normal atmospheric pressure.
Precision placement of nano-materials
Critical to the implementation of nanotechnology is a deposition methodology that allows novel materials to be precisely added to conventional CMOS components in a scalable manner.
Out super-fine inkjet technology enables the precise arrangement of various nanomaterials on a any type substrate.
- Functional ceramics
Photo credits
Dr. Takashi Iijima
Research Institute of Instrumentation Frontier
The National Institute of Advanced Industrial Science and Technology
- Electro-conductive polymer
Photo credits
Dr. Wataru Mizutani
Nanotechnology Research Institute
The National Institute of Advanced Industrial Science and Technology
- Carbon nanotube
Photo credits
Associate Prof. Hiroki Ago
Institute for Materials Chemistry and Engineering
Kyushu University
Maskless precision patterning
With traditional patterning method satisfactory liquid placements is a challenge as bulges may develop due to the surface tension of the liquid. The effect is exacerbated as feature sizes approach 10 microns and lower.
Our super-fine inkjet technology effectively avoids this problem by accelerating the drying of a line, thus minimizing the disruption in a pattern formed in a liquid state.
 Drawing pattern |
 Bulging due to surface tension |
 |
 A drawing pattern by conventional inkjet printer |
 CAD data |
 A drawing pattern by super-fine inkjet printer |
Using nanopaste to draw a super-fine wiring pattern
An interesting aspect to metals is that for particles smaller than 20 nm in diameter, the effective melting point decreases dramatically. For example, the melting point of a super-fine silver particle may be as low as room temperature, whereas a micron sized particle of silver melts at 961ºC!
Using a solution with these nano-size particles as ink, with out novel printer, enables maskless patterning with a line width of several microns, which is comparable to the photolithographic methods, but at room temperature and normal atmospheric pressure!
Forming a three-dimensional structure
Because super-fine liquid droplets dry very quickly, the droplets can be accumulated to form a three-dimensional structure by shooting them at a fixed target.
